The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 10, 2025

Filed:

Jan. 28, 2022
Applicant:

Fei Company, Hillsboro, OR (US);

Inventors:

Yuchen Deng, Eindhoven, NL;

Erik Franken, Nuenen, NL;

Bart Van Knippenberg, Helden, NL;

Holger Kohr, Eindhoven, NL;

Assignee:

FEI Company, Hillsboro, OR (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06T 7/00 (2017.01); G01N 23/04 (2018.01); G01N 23/06 (2018.01); G01N 23/2251 (2018.01);
U.S. Cl.
CPC ...
G06T 7/0002 (2013.01); G01N 23/04 (2013.01); G01N 23/06 (2013.01); G01N 23/2251 (2013.01); G01N 2223/04 (2013.01); G01N 2223/07 (2013.01); G01N 2223/3307 (2013.01); G01N 2223/418 (2013.01); G06T 2207/10061 (2013.01);
Abstract

Various approaches are provided for automatically focusing particle beams for SPA. In one example, a method includes determining a focus adjustment for a region of a sample to achieve a targeted defocus based on at least one defocus measurement from at least one neighboring region of the sample, and causing an acquisition of an image of the sample at the region with the focus adjustment. In this way, a targeted defocus may be achieved across regions of a sample with reduced auxiliary imaging, thereby providing increased and uniform image quality while reducing the time and thus increasing the throughput of processing.


Find Patent Forward Citations

Loading…