The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 20, 2025
Filed:
Dec. 17, 2020
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventors:
Wei Fang, Milpitas, CA (US);
Zhong-wei Chen, San Jose, CA (US);
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/24 (2006.01); H01J 37/073 (2006.01); H01J 37/075 (2006.01);
U.S. Cl.
CPC ...
H01J 37/243 (2013.01); H01J 37/073 (2013.01); H01J 37/075 (2013.01);
Abstract
Apparatuses, methods, and systems for ultra-fast beam current adjustment for a charged-particle inspection system include an charged-particle source configured to emit charged particles for scanning a sample; and an emission booster configured to configured to irradiate electromagnetic radiation onto the charged-particle source for boosting charged-particle emission in a first cycle of a scanning operation of the charged-particle inspection system, and to stop irradiating the electromagnetic radiation in a second cycle of the scanning operation.