The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 06, 2025

Filed:

Jun. 28, 2022
Applicant:

Sunrise Memory Corporation, San Jose, CA (US);

Inventors:

Scott Brad Herner, Portland, OR (US);

Wu-Yi Henry Chien, San Jose, CA (US);

Jie Zhou, San Jose, CA (US);

Eli Harari, Saratoga, CA (US);

Assignee:

SUNRISE MEMORY CORPORATION, San Jose, CA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/11582 (2016.12); H01L 21/308 (2005.12); H01L 29/66 (2005.12); H10B 43/27 (2022.12); H10D 30/01 (2024.12);
U.S. Cl.
CPC ...
H10B 43/27 (2023.01); H01L 21/308 (2012.12); H10D 30/0413 (2024.12);
Abstract

Various methods overcome the limitations and achieve superior scaling by (i) replacing a single highly challenging high aspect ratio etch step with two or more etch steps of less challenging aspect ratios and which involve wider and more mechanically stable active strips, (ii) using dielectric pillars for support and to maintain structural stability during a high aspect ratio etch step and subsequent processing steps, or (iii) using multiple masking steps to provide two or more etch steps of less challenging aspect ratios and which involve wider and more mechanically stable active strips.


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