The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 06, 2025

Filed:

Jun. 23, 2021
Applicant:

Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;

Inventors:

Te-Chien Hou, Hsinchu, TW;

Po-Chin Nien, Hsinchu, TW;

Chih Hung Chen, Hsinchu, TW;

Ying-Tsung Chen, Hsinchu, TW;

Kei-Wei Chen, Hsinchu, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/321 (2005.12); B24B 37/34 (2011.12); B24B 53/017 (2011.12); H01L 21/306 (2005.12);
U.S. Cl.
CPC ...
H01L 21/30625 (2012.12); B24B 37/34 (2012.12); B24B 53/017 (2012.12);
Abstract

A chemical mechanical planarization system includes a chemical mechanical planarization pad that rotates during a chemical mechanical planarization process. A chemical mechanical planarization head places a semiconductor wafer in contact with the chemical mechanical planarization pad during the process. A slurry supply system supplies a slurry onto the pad during the process. A pad conditioner conditions the pad during the process. An impurity removal system removes debris and impurities from the slurry.


Find Patent Forward Citations

Loading…