The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 29, 2025
Filed:
Nov. 17, 2022
Applicant:
Rigaku Corporation, Tokyo, JP;
Inventors:
Assignee:
RIGAKU CORPORATION, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 23/207 (2017.12); G01N 23/20016 (2017.12);
U.S. Cl.
CPC ...
G01N 23/207 (2012.12); G01N 23/20016 (2012.12); G01N 2223/056 (2012.12); G01N 2223/1003 (2012.12); G01N 2223/1016 (2012.12); G01N 2223/3035 (2012.12); G01N 2223/3037 (2012.12); G01N 2223/304 (2012.12); G01N 2223/32 (2012.12);
Abstract
A correction amount specifying apparatus comprises circuitry for storing diffraction data including a combination of the diffraction angle of the irradiation X-rays with respect to the sample rotation angle and the sample surface height, the diffraction data being acquired by irradiating X-rays to a standard sample that is an aggregate of isotropic and stress free crystal particles, determining a first correspondence relationship based on the diffraction data, and specifying a correction amount of the sample surface height with respect to a desired sample rotation angle and a desired diffraction angle based on the first correspondence relationship.