The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 29, 2025

Filed:

Jul. 27, 2023
Applicant:

Mitsubishi Materials Corporation, Tokyo, JP;

Inventors:

Takumi Odaira, Kitamoto, JP;

Yuki Ito, Kitamoto, JP;

Kenichiro Kawasaki, Kitamoto, JP;

Kazunari Maki, Kitamoto, JP;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C22C 9/00 (2005.12); B32B 15/04 (2005.12); B32B 15/20 (2005.12); B32B 18/00 (2005.12);
U.S. Cl.
CPC ...
C22C 9/00 (2012.12); B32B 15/04 (2012.12); B32B 15/20 (2012.12); B32B 18/00 (2012.12); B32B 2250/02 (2012.12); B32B 2457/00 (2012.12); Y10T 428/12431 (2015.01);
Abstract

This pure copper material includes Cu in an amount of 99.9 mass % or more and 99.999 mass % or less, an average crystal grain size in a rolled surface is 10 μm or more, and when a measurement area of 1 mmor more is measured by an EBSD method at a measurement interval of 1 μm, measurement points at which a CI value obtained by an analysis using data analysis software OIM is 0.1 or less are excluded, and boundaries between adjacent pixels with a misorientation of 5° or more are regarded as crystal grain boundaries, an average of local orientation spread (LOS) is 2.00° or less.


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