The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 21, 2025
Filed:
Feb. 13, 2022
Changxin Memory Technologies, Inc., Hefei, CN;
Zhaopei Cui, Hefei, CN;
Bingyu Zhu, Hefei, CN;
CHANGXIN MEMORY TECHNOLOGIES, INC., Hefei, CN;
Abstract
The present disclosure relates to a method for manufacturing a semiconductor structure, the method includes: a substrate is provided; a bit line array is formed on an upper surface of the substrate, the bit line array includes several bit lines arranged at intervals, the bit lines are connected through at least one support pattern, and the at least one support pattern penetrates through the bit line array along an arrangement direction of the bit lines; a bit line side wall is formed on side walls of each of the bit lines; a part of the at least one support pattern is removed so as to expose at least one sacrificial layer; and the at least one sacrificial layer is removed, so as to form at least one air gap between the first side wall dielectric layers and the second side wall dielectric layers.