The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 21, 2025

Filed:

Jan. 21, 2024
Applicant:

Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;

Inventors:

Hsin-Yi Lee, Hsinchu, TW;

Cheng-Lung Hung, Hsinchu, TW;

Chi On Chui, Hsinchu, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/40 (2005.12); H01L 21/28 (2005.12); H01L 21/8238 (2005.12); H01L 27/092 (2005.12); H01L 29/06 (2005.12); H01L 29/423 (2005.12); H01L 29/49 (2005.12); H01L 29/51 (2005.12); H01L 29/66 (2005.12); H01L 29/786 (2005.12);
U.S. Cl.
CPC ...
H01L 29/401 (2012.12); H01L 21/28088 (2012.12); H01L 21/28176 (2012.12); H01L 21/823842 (2012.12); H01L 27/092 (2012.12); H01L 29/0673 (2012.12); H01L 29/42392 (2012.12); H01L 29/4966 (2012.12); H01L 29/517 (2012.12); H01L 29/66742 (2012.12); H01L 29/66787 (2012.12); H01L 29/78696 (2012.12); H01L 21/823807 (2012.12);
Abstract

A device includes a first nanostructure; a second nanostructure over the first nanostructure; a first high-k gate dielectric around the first nanostructure; a second high-k gate dielectric around the second nanostructure; and a gate electrode over the first and second high-k gate dielectrics. The gate electrode includes a first work function metal; a second work function metal over the first work function metal; and a first metal residue at an interface between the first work function metal and the second work function metal, wherein the first metal residue has a metal element that is different than a metal element of the first work function metal.


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