The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 21, 2025

Filed:

Aug. 29, 2021
Applicant:

Taiwan Semiconductor Manufacturing Company Ltd., Hsinchu, TW;

Inventors:

Sheng-Chun Yang, Tainan, TW;

Chih-Lung Cheng, Miaoli County, TW;

Yi-Ming Lin, Tainan, TW;

Po-Chih Huang, Tainan, TW;

Yu-Hsiang Juan, Taichung, TW;

Xuan-Yang Zheng, Tainan, TW;

Ren-Jyue Wang, Hsinchu, TW;

Chih-Yuan Wang, Tainan, TW;

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/687 (2005.12); H01L 21/67 (2005.12); H01L 21/683 (2005.12);
U.S. Cl.
CPC ...
H01L 21/687 (2012.12); H01L 21/67253 (2012.12); H01L 21/6838 (2012.12);
Abstract

The present disclosure provides a method and a system therefore for processing wafer. The method includes: extracting a first gas from a chamber via a first route; blocking a second route used to be pumped down to chuck a wafer placed in the chamber, wherein the second route connects the chamber and the first route; and providing a second gas via a third route to purge a junction of the first route and the second route.


Find Patent Forward Citations

Loading…