The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 14, 2025

Filed:

May. 02, 2021
Applicant:

Taiwan Semiconductor Manufacturing Company Limited, Hsin-Chu, TW;

Inventors:

Che-Cheng Chang, New Taipei, TW;

Chih-Han Lin, Hsinchu, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/088 (2005.12); H01L 21/306 (2005.12); H01L 29/06 (2005.12); H01L 29/08 (2005.12); H01L 29/423 (2005.12); H01L 29/66 (2005.12); H01L 29/78 (2005.12);
U.S. Cl.
CPC ...
H01L 27/0886 (2012.12); H01L 21/30604 (2012.12); H01L 29/0657 (2012.12); H01L 29/0847 (2012.12); H01L 29/42364 (2012.12); H01L 29/66545 (2012.12); H01L 29/66795 (2012.12); H01L 29/7848 (2012.12); H01L 29/785 (2012.12);
Abstract

A semiconductor device includes at least one semiconductor fin, a gate electrode, at least one gate spacer, and a gate dielectric. The semiconductor fin includes at least one recessed portion and at least one channel portion. The gate electrode is present on at least the channel portion of the semiconductor fin. The gate spacer is present on at least one sidewall of the gate electrode. The gate dielectric is present at least between the channel portion of the semiconductor fin and the gate electrode. The gate dielectric extends farther than at least one end surface of the channel portion of the semiconductor fin.


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