The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 14, 2025
Filed:
Apr. 14, 2022
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Asml Netherlands B.v., Veldhoven, NL;
Marcus Van De Kerkhof, Veldhoven, NL;
CARL ZEISS SMT GMBH, Oberkochen, DE;
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
An EUV collector mirror has a reflection surface () to reflect usable EUV light which impinges on the reflection surface () from a source region () to a subsequent EUV optics. The reflection surface () carries a pump light grating structure () configured to retroreflect pump light () which impinges upon the pump light grating structure () from the source region () back to the source region (). The pump light () has a wavelength deviating from the wavelength of the usable EUV light. Such EUV collector mirror enables a high conversion efficiency between the energy of pump light of a laser discharged produced plasma (LDPP) EUV light source on the one hand and the resulting usable EUV energy on the other.