The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 08, 2025
Filed:
Mar. 26, 2020
Asml Netherlands B.v., Veldhoven, NL;
Scott Anderson Middlebrooks, Duizel, NL;
Adrianus Cornelis Matheus Koopman, Hilversum, NL;
Markus Gerardus Martinus Maria Van Kraaij, Eindhoven, NL;
Maxim Pisarenco, Son en Breugel, NL;
Stefan Hunsche, Santa Clara, CA (US);
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
A method for training a machine learning model configured to predict a substrate image corresponding to a printed pattern of a substrate as measured via a metrology tool. The method involves obtaining a training data set including (i) metrology data of the metrology tool used to measure the printed pattern of the substrate, and (ii) a representation of a mask pattern employed for imaging the printed pattern on the substrate; and training, based on the training data set, a machine learning model to predict the substrate image of the substrate as measured by the metrology tool such that a cost function is improved, wherein the cost function includes a relationship between the predicted substrate image and the metrology data.