The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 08, 2025

Filed:

Apr. 02, 2020
Applicant:

Tsinghua University, Beijing, CN;

Inventors:

Yu Zhu, Beijing, CN;

Jinchun Hu, Beijing, CN;

Rujin Han, Beijing, CN;

Chang Tian, Beijing, CN;

Ming Zhang, Beijing, CN;

Wensheng Yin, Beijing, CN;

Rong Cheng, Beijing, CN;

Dengfeng Xu, Beijing, CN;

Assignee:

TSINGHUA UNIVERSITY, Beijing, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 9/02015 (2022.01); G01B 11/02 (2006.01);
U.S. Cl.
CPC ...
G01B 9/02027 (2013.01); G01B 11/02 (2013.01);
Abstract

A high-resolution phase detection method and system based on a plane grating laser interferometer. The method uses a dual-frequency interferometer to measure the displacement, and the measurement signal processing comprises an integral part and a decimal portion, a phase equation set of a displacement measurement signal is constructed according to a measurement optical path principle of a heterodyne plane grating laser interferometer; a non-linear equation set for which the unknowns are instantaneous phase, interval phase and signal amplitude is established; and the equation sets above are solved by using the least squares method, so as to realize phase discrimination, thereby realizing precise displacement measurement. The method can solve the problems in the traditional time measurement-based phase detection technology, such as low measurement accuracy, and failing to satisfy small measuring range measurement. The measurement method can be applied to systems such as precision manufacturing equipment and lithography machine.


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