The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 01, 2025
Filed:
Mar. 29, 2022
International Business Machines Corporation, Armonk, NY (US);
Junli Wang, Slingerlands, NY (US);
Brent A Anderson, Jericho, VT (US);
Terence Hook, Jericho Center, VT (US);
Indira Seshadri, Niskayuna, NY (US);
Albert M. Young, Fishkill, NY (US);
Stuart Sieg, Albany, NY (US);
Su Chen Fan, Cohoes, NY (US);
Shogo Mochizuki, Mechanicville, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A high aspect ratio contact structure formed within a dielectric material includes a top portion and a bottom portion. The top portion of the contact structure includes a tapering profile towards the bottom portion. A first metal stack surrounded by an inner spacer is located within the top portion of the contact structure and a second metal stack is located within the bottom portion of the contact structure. A width of the bottom portion of the contact structure is greater than a minimum width of the top portion of the contact structure.