The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 01, 2025

Filed:

Mar. 12, 2021
Applicant:

Mitsubishi Materials Corporation, Tokyo, JP;

Inventors:

Kazuaki Sakai, Aizuwakamatsu, JP;

Naoki Miyashima, Aizuwakamatsu, JP;

Kazunari Maki, Aizuwakamatsu, JP;

Shinichi Funaki, Aizuwakamatsu, JP;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B32B 15/01 (2006.01); B32B 15/20 (2006.01); C22C 9/06 (2006.01); C25D 3/30 (2006.01); C25D 5/50 (2006.01);
U.S. Cl.
CPC ...
C25D 5/505 (2013.01); B32B 15/01 (2013.01); B32B 15/20 (2013.01); C22C 9/06 (2013.01); C25D 3/30 (2013.01);
Abstract

A Cu—Ni—Si based copper alloy containing Ni and Si: in a center portion in a plate thickness direction, containing 0.4% by mass or more and 5.0% by mass or less of Ni, 0.05% by mass or more and 1.5% by mass or less of Si, and the balance Cu and inevitable impurities; where an Ni concentration on a plate surface is 70% or less of a center Ni concentration in the thickness center portion; a surface layer portion having a depth from the plate surface to be 90% of the center Ni concentration; in the surface layer portion, the Ni concentration increases from the plate surface toward the thickness center portion at 5.0% by mass/μm or more and 100% by mass/μm or less of a concentration gradient; to improve the electric connection reliability under high-temperature environment.


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