The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 25, 2025

Filed:

Jul. 06, 2021
Applicant:

Deca Technologies Usa, Inc., Tempe, AZ (US);

Inventors:

Timothy L. Olson, Phoenix, AZ (US);

Edward Hudson, San Tan Valley, AZ (US);

Craig Bishop, Scottsdale, AZ (US);

Assignee:

Deca Technologies USA, Inc., Tempe, AZ (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 23/00 (2006.01); H01L 21/56 (2006.01); H01L 25/065 (2023.01);
U.S. Cl.
CPC ...
H01L 24/19 (2013.01); H01L 21/561 (2013.01); H01L 21/568 (2013.01); H01L 24/11 (2013.01); H01L 24/96 (2013.01); H01L 25/0652 (2013.01); H01L 2224/11001 (2013.01);
Abstract

A method of making a semiconductor device may include providing a carrier and forming a first photoresist over the carrier with first openings through the first photoresist. A non-planar conductive seed layer may be formed over the first photoresist and conformally extend into the first openings through the first photoresist. A second photoresist may be formed over the first photoresist and over the non-planar conductive seed layer. The second photoresist layer may be patterned to form second openings through the second photoresist that extend to the non-planar conductive seed layer. Conductive posts may be plated over the non-planar conductive seed layer and within the second openings. The second photoresist may be removed while leaving in place the first photoresist. A semiconductor die may be coupled to the carrier. The semiconductor die, the conductive posts, and the first photoresist may be encapsulated with mold compound.


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