The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 25, 2025
Filed:
Jun. 09, 2022
Applied Materials, Inc., Santa Clara, CA (US);
David Thompson, Santa Clara, CA (US);
Bhaskar Jyoti Bhuyan, Santa Clara, CA (US);
Mark Saly, Santa Clara, CA (US);
Lisa Enman, Santa Clara, CA (US);
Aaron Dangerfield, Santa Clara, CA (US);
Jesus Candelario Mendoza, Santa Clara, CA (US);
Jeffrey W. Anthis, Santa Clara, CA (US);
Lakmal Kalutarage, Santa Clara, CA (US);
Applied Materials , Inc., Santa Clara, CA (US);
Abstract
Described herein is a method for selectively cleaning and/or etching a sample. The method includes selectively forming a film in a trench of a substrate such that the trench may be selectively etched. A polymer film is deposited on the bottom surface of the trench without being deposited on the side wall. A second film is selectively formed in the trench without forming the second film on the polymer film. The polymer is then removed from the bottom surface of the trench and then etching is performed on the bottom surface of the trench using an etch chemistry, wherein the second film protects the side wall from being etched.