The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 25, 2025

Filed:

Jul. 18, 2023
Applicant:

Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;

Inventors:

Chih-Hang Chang, Taoyuan, TW;

I-Shi Wang, Sanxia Township, TW;

Jen-Hao Liu, Zhunan Township, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B81C 1/00 (2006.01); B81C 3/00 (2006.01);
U.S. Cl.
CPC ...
B81C 1/00238 (2013.01); B81C 1/00269 (2013.01); B81C 1/00888 (2013.01); B81C 3/005 (2013.01); B81C 2201/013 (2013.01); B81C 2201/0143 (2013.01); B81C 2201/0146 (2013.01); B81C 2203/035 (2013.01);
Abstract

A semiconductor device structure is provided. The semiconductor device structure includes a first substrate including a first face and a second face opposite the first face. A second substrate is bonded to the first face of the first substrate such that the second face of the first substrate faces away from the second substrate. One or more recesses are arranged in the second face of the first substrate and are configured to compensate for thermal expansion or thermal contraction.


Find Patent Forward Citations

Chang, Chih-Hang. (2025). Bonding process for forming semiconductor device structure (U.S. Patent No. 12258265). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12258265

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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