The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 11, 2025

Filed:

Aug. 30, 2021
Applicant:

Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;

Inventors:

Chih-Hsuan Chen, Hsinchu, TW;

Chia-Hao Pao, Kaohsiung, TW;

Shih-Hao Lin, Hsinchu, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10B 10/00 (2023.01); G11C 11/412 (2006.01);
U.S. Cl.
CPC ...
H10B 10/12 (2023.02); H10B 10/125 (2023.02); G11C 11/412 (2013.01);
Abstract

A Static Radom Access Memory (SRAM) cell includes a pass-gate transistor and a pull-down transistor. The pass-gate transistor includes a first active region and a first gate structure engaging the first active region. The pull-down transistor includes a second active region and a second gate structure engaging the second active region. The SRAM cell further includes a first isolation feature abutting the first gate structure and a second isolation feature abutting the second gate structure. The first isolation feature is spaced from the first active region of the pass-gate transistor for a first distance. The second isolation feature is spaced from the second active region of the pull-down transistor for a second distance that is larger than the first distance.


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