The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 04, 2025
Filed:
Aug. 03, 2023
D2s, Inc., San Jose, CA (US);
Akira Fujimura, Saratoga, CA (US);
Harold Robert Zable, Palo Alto, CA (US);
Nagesh Shirali, San Jose, CA (US);
Abhishek Shendre, Fremont, CA (US);
William E. Guthrie, Santa Clara, CA (US);
Ryan Pearman, San Jose, CA (US);
D2S, Inc., San Jose, CA (US);
Abstract
Methods and systems for exposing a desired shape in an area on a surface using a charged particle beam system include determining a local pattern density for the area, based on an original set of exposure information. A pre-proximity effect correction (PEC) maximum dose for the local pattern density is determined, based on a pre-determined target post-PEC maximum dose. The pre-PEC maximum dose may be calculated near an edge of the desired shape. Methods also include modifying the original set of exposure information with the pre-PEC maximum dose to create a modified set of exposure information.