The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 25, 2025

Filed:

Dec. 07, 2020
Applicant:

Intel Corporation, Santa Clara, CA (US);

Inventors:

Tyler Leuten, Orangeville, CA (US);

Yi Xu, Folsom, CA (US);

Eleanor Patricia Paras Rabadam, Folsom, CA (US);

Assignee:

Intel Corporation, Santa Clara, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 23/48 (2006.01); H01L 21/56 (2006.01); H01L 23/00 (2006.01); H01L 23/13 (2006.01); H01L 23/31 (2006.01); H01L 23/52 (2006.01); H01L 25/00 (2006.01); H01L 25/065 (2023.01); H01L 25/18 (2023.01);
U.S. Cl.
CPC ...
H01L 25/0652 (2013.01); H01L 21/56 (2013.01); H01L 23/13 (2013.01); H01L 23/3135 (2013.01); H01L 24/16 (2013.01); H01L 24/17 (2013.01); H01L 24/48 (2013.01); H01L 25/18 (2013.01); H01L 25/50 (2013.01); H01L 2224/16227 (2013.01); H01L 2224/17135 (2013.01); H01L 2224/48145 (2013.01); H01L 2224/48227 (2013.01);
Abstract

Integrated circuit assemblies may contain various mold, fill, and/or underfill materials. As these integrated circuit assemblies become ever smaller, it becomes challenging to prevent voids from forming within these materials, which may affect the reliability of the integrated circuit assemblies. Since integrated circuit assemblies are generally formed by electrically attaching integrated circuit dice on electronic substrates, the present description proposes injecting the mold, fill, and/or underfill materials through openings formed in the electronic substrate to fill voids that may form and/or to prevent the formation of the voids altogether.


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