The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 04, 2025
Filed:
Aug. 10, 2021
Applicant:
Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;
Inventors:
Chansyun Yang, Hsinchu, TW;
Chan-Lon Yang, Taipei, TW;
Keh-Jeng Chang, Hsinchu, TW;
Perng-Fei Yuh, Walnut Creek, CA (US);
Assignee:
Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); G03F 7/00 (2006.01); H01L 21/02 (2006.01); H01L 21/66 (2006.01); H01L 21/027 (2006.01);
U.S. Cl.
CPC ...
H01L 22/20 (2013.01); G03F 7/70875 (2013.01); H01L 21/67253 (2013.01); H01L 22/12 (2013.01); H01L 22/14 (2013.01); G03F 7/70625 (2013.01); H01L 21/0275 (2013.01);
Abstract
An apparatus includes a beam conditioning assembly configured to output one or more wavelengths to a substrate being processed and receive one or more reflected wavelengths from the substrate, and a machine learning device configured to process the one or more reflected wavelengths to predict a process variable and compare the predicted process variable with a measured process variable to obtain a comparison result.