The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 04, 2025
Filed:
Aug. 04, 2020
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventors:
Jian Zhang, San Jose, CA (US);
Ning Ye, San Jose, CA (US);
Zhiwen Kang, San Jose, CA (US);
Yixiang Wang, San Jose, CA (US);
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/26 (2006.01); G02B 27/09 (2006.01); H01J 37/02 (2006.01); H01J 37/28 (2006.01);
U.S. Cl.
CPC ...
H01J 37/026 (2013.01); G02B 27/0966 (2013.01); H01J 37/28 (2013.01); H01J 2237/0047 (2013.01);
Abstract
A system and a method for manipulating a beam of an Advanced Charge Controller module in different planes in an e-beam system are provided. Some embodiments of the system include a lens system configured to manipulate a beam in the tangential plane and the sagittal plane such that the beam spot is projected onto the wafer with high luminous energy. Some embodiments of the system include a lens system comprising at least two cylindrical lens.