The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 04, 2025

Filed:

Nov. 22, 2023
Applicant:

Taiwan Semiconductor Manufacturing Company Ltd., Hsinchu, TW;

Inventors:

Huan-Chieh Chen, Taichung, TW;

Jhih-Ren Lin, New Taipei, TW;

Tai-Pin Liu, Hsinchu County, TW;

Shyue-Shin Tsai, Tainan, TW;

Keith Kuang-Kuo Koai, Hsinchu County, TW;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/40 (2006.01); B05B 1/18 (2006.01); C23C 16/455 (2006.01); C23C 16/46 (2006.01); C23C 16/50 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45565 (2013.01); B05B 1/185 (2013.01); C23C 16/46 (2013.01); C23C 16/50 (2013.01);
Abstract

A shower head structure and a plasma processing apparatus are provided. The shower head structure includes a plate body with a first zone and a second zone on a first surface. A plurality of first through holes are in the first zone, each of the first through holes having a diameter uniform with others of the first through holes. A plurality of second through holes are in the second zone. The first zone is in connection with the second zone, and the diameter of each of the first through holes is greater than a diameter of each of the second through holes. A plasma processing apparatus includes the shower head structure is also provided.


Find Patent Forward Citations

Loading…