The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 28, 2025

Filed:

Oct. 05, 2021
Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Andrew Metz, Albany, NY (US);

Caitlin Philippi, Albany, NY (US);

Sophie Thibaut, Allbany, NY (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/417 (2006.01); H01L 29/40 (2006.01); H01L 29/66 (2006.01);
U.S. Cl.
CPC ...
H01L 29/41791 (2013.01); H01L 29/401 (2013.01); H01L 29/41733 (2013.01); H01L 29/66742 (2013.01); H01L 29/66795 (2013.01);
Abstract

An exemplary method of forming a semiconductor device includes forming, in a substrate, an active region protruding vertically from a major surface of the substrate, the active region including a semiconductor source-drain (S/D) region and a first 3-D channel structure, the S/D region physically contacting the first 3-D channel structure, and forming an opening extending into the S/D region, the opening having a depth greater than half of a height of the first 3-D channel structure; and forming a metallic plug in the opening, the metallic plug making electrical contact with the S/D region.


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