The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 21, 2025

Filed:

May. 06, 2022
Applicant:

Taiwan Semiconductor Manufacturing Company Limited, Hsinchu, TW;

Inventors:

Georgios Vellianitis, Heverlee, BE;

Marcus Johannes Henricus Van Dal, Linden, BE;

Gerben Doornbos, Kessel-Lo, BE;

Mauricio Manfrini, Zhubei, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/786 (2006.01); H01L 27/06 (2006.01); H01L 27/088 (2006.01); H01L 29/08 (2006.01); H01L 29/66 (2006.01); H01L 29/78 (2006.01);
U.S. Cl.
CPC ...
H01L 29/78693 (2013.01); H01L 29/0847 (2013.01); H01L 29/6675 (2013.01);
Abstract

A transistor includes a vertical stack containing, in order from bottom to top or from top to bottom, a gate electrode, a gate dielectric, and an active layer and located over a substrate. The active layer includes an amorphous semiconductor material. A crystalline source region including a first portion of a crystalline semiconductor material overlies, and is electrically connected to, a first end portion of the active layer. A crystalline drain region including a second portion of the crystalline semiconductor material overlies, and is electrically connected to, a second end portion of the active layer.


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