The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 14, 2025
Filed:
Mar. 22, 2018
Applicant:
Axus Technology, Llc, Chandler, AZ (US);
Inventors:
Daniel Ray Trojan, Chandler, AZ (US);
Robert Clark Roberts, Charlotte, NC (US);
Assignee:
Axus Technology, LLC, Chandler, AZ (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/306 (2006.01); B24B 37/04 (2012.01); B24B 37/11 (2012.01); C23F 4/00 (2006.01); H01J 37/32 (2006.01); H01L 21/321 (2006.01);
U.S. Cl.
CPC ...
H01L 21/30625 (2013.01); B24B 37/044 (2013.01); B24B 37/11 (2013.01); C23F 4/00 (2013.01); H01J 37/32825 (2013.01); H01L 21/3212 (2013.01);
Abstract
A method and a system for polishing a wafer is disclosed. In one aspect, the method includes generating atmospheric plasma. The method further includes treating a component of a wafer processing system with the atmospheric plasma. The method further includes delivering a slurry containing abrasive and corrosive particles to a surface of the wafer processing system which includes atmospheric plasma-treated component. The method further includes polishing a wafer with the abrasive and corrosive particles.