The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 14, 2025
Filed:
Jul. 26, 2019
Lam Research Corporation, Fremont, CA (US);
Roger Patrick, Mountain View, CA (US);
Neil M. P. Benjamin, Palo Alto, CA (US);
Lee Chen, Cedar Creek, TX (US);
Alan Schoepp, Ben Lomond, CA (US);
Clint Edward Thomas, Newark, CA (US);
Thomas W. Anderson, Hayward, CA (US);
Sang Heon Song, San Jose, CA (US);
Lam Research Corporation, Fremont, CA (US);
Abstract
An RF antenna is configured, when powered, to inductively generate plasma in a process region of a chamber, including: an array of parallel conductive lines that are oriented along a plane, the array including a first conductive line, a second conductive line, a third conductive line, and a fourth conductive line; wherein the first and second conductive lines are adjacent, wherein the second and third conductive lines are adjacent, and wherein the third and fourth conductive lines are adjacent; wherein when the RF antenna is powered, current flow in the adjacent first and second conductive lines occurs in an opposite direction, current flow in the adjacent second and third conductive lines occurs in a same direction, current flow in the adjacent third and fourth conductive lines occurs in an opposite direction.