The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 07, 2025

Filed:

Aug. 27, 2021
Applicant:

Yangtze Memory Technologies Co., Ltd., Wuhan, CN;

Inventors:

Yuancheng Yang, Wuhan, CN;

Bingjie Yan, Wuhan, CN;

Di Wang, Wuhan, CN;

Cuicui Kong, Wuhan, CN;

Wenxi Zhou, Wuhan, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/11582 (2017.01); H10B 43/27 (2023.01);
U.S. Cl.
CPC ...
H10B 43/27 (2023.02);
Abstract

A three-dimensional (3D) memory device includes a doped semiconductor layer, a stack structure, and a channel structure. The stack structure includes interleaved conductive layers and dielectric layers formed on the doped semiconductor layer. The conductive layers include a plurality of word lines, and a drain select gate line. The channel structure extends through the stack structure along a first direction and is in contact with the doped semiconductor layer. The drain select gate line includes a first dielectric layer in contact with the channel structure, and a first polysilicon layer in contact with the first dielectric layer.


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