The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 31, 2024
Filed:
Jul. 07, 2022
Applicant:
Semes Co., Ltd., Chungcheongnam-do, KR;
Inventors:
Su Hyung Lee, Gyeonggi-do, KR;
Ga Yeon Kim, Gyeonggi-do, KR;
Sung Ho Lee, Gyeonggi-do, KR;
Ju Yong Jang, Gyeonggi-do, KR;
Assignee:
SEMES CO., LTD., Chungcheongnam-Do, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01R 27/26 (2006.01); G01R 31/56 (2020.01); H01J 37/32 (2006.01); H01L 21/683 (2006.01);
U.S. Cl.
CPC ...
G01R 27/2605 (2013.01); G01R 31/56 (2020.01); H01J 37/32715 (2013.01); H01L 21/6833 (2013.01); H01J 2237/2007 (2013.01); H01J 2237/24592 (2013.01); H01L 21/6831 (2013.01);
Abstract
An apparatus and a method for non-destructive inspection of quality of an electrostatic chuck are disclosed. The apparatus includes a measurement unit for measuring a first capacitance of a dielectric layer of the electrostatic chuck and for measuring a second capacitance of an electrode installed in the dielectric layer; and a control unit configured to evaluate quality of the electrode, based on the first capacitance and the second capacitance.