The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 31, 2024

Filed:

Feb. 22, 2021
Applicant:

Ebara Corporation, Tokyo, JP;

Inventors:

Masaya Seki, Tokyo, JP;

Masaki Tomita, Tokyo, JP;

Shao Hua Chang, Tokyo, JP;

Assignee:

EBARA CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C25D 17/06 (2006.01); C25D 17/00 (2006.01); C25D 21/12 (2006.01);
U.S. Cl.
CPC ...
C25D 17/06 (2013.01); C25D 17/004 (2013.01); C25D 21/12 (2013.01);
Abstract

Provided is a technique that ensures suppressed invasion of particles generated at a bearing of a rotation mechanism into a plating tank. A plating apparatusincludes a labyrinth seal member. The labyrinth seal member includes an inner labyrinth sealarranged below a bearingto seal the bearing, an outer labyrinth sealarranged outside in a radial direction of the rotation shaftwith respect to the inner labyrinth seal, a delivery portconfigured to supply air to an inner seal spaceformed inside in the radial direction with respect to the inner labyrinth seal, and a suction portconfigured to suction air in an outer seal spaceformed outside in the radial direction with respect to the inner labyrinth seal and inside in the radial direction with respect to the outer labyrinth seal.


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