The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 24, 2024

Filed:

Jan. 03, 2022
Applicant:

Nami Mos Co. Ltd., New Taipei, TW;

Inventor:

Fu-Yuan Hsieh, New Taipei, TW;

Assignee:

NAMI MOS CO., LTD., New Taipei, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/10 (2006.01); H01L 29/40 (2006.01); H01L 29/78 (2006.01);
U.S. Cl.
CPC ...
H01L 29/1095 (2013.01); H01L 29/407 (2013.01); H01L 29/7813 (2013.01);
Abstract

The present invention introduces a new shielded gate trench SBR (Super Barrier Rectifier) wherein an epitaxial layer having special MSE (multiple stepped epitaxial) layers with different doping concentrations decreasing in a direction from a substrate to a top surface of the epitaxial layer, wherein each of the MSE layers has an uniform doping concentration as grown. Forward voltage Vis significantly reduced with the special MSE layers. An integrated circuit comprising a SGT MOSFET and a SBR formed on a single chip obtains benefits of low on-resistance, low reverse recovery time and high avalanche capability from the special MSE layers.


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