The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 10, 2024

Filed:

Aug. 04, 2021
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Oscar van der Straten, Guilderland Center, NY (US);

Koichi Motoyama, Clifton Park, NY (US);

Joseph F. Maniscalco, Lake Katrine, NY (US);

Chih-Chao Yang, Glenmont, NY (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H10N 50/80 (2023.01); H10B 61/00 (2023.01); H10N 50/01 (2023.01);
U.S. Cl.
CPC ...
H10N 50/80 (2023.02); H10N 50/01 (2023.02); H10B 61/22 (2023.02);
Abstract

Memory structures including an MTJ-containing pillar that is void of re-sputtered bottom electrode metal particles is provided by first forming the MTJ-containing pillar on a sacrificial material-containing structure, and thereafter replacing the sacrificial material-containing structure with at least a replacement bottom electrode structure. In some embodiments, the sacrificial material-containing structure is replaced with both a bottom electrode diffusion barrier liner and a replacement bottom electrode structure.


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