The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 10, 2024
Filed:
Sep. 21, 2022
Tokyo Electron Limited, Tokyo, JP;
Natsumi Torii, Miyagi, JP;
TOKYO ELECTRON LIMITED, Tokyo, JP;
Abstract
A plasma processing apparatus comprising: a chamber; a substrate support disposed in the chamber and including a lower electrode, a substrate supporting surface for supporting a substrate, and an edge ring disposed to surround the substrate placed on the substrate supporting surface; an upper electrode disposed above the lower electrode; a power supply portion configured to supply two or more powers having different frequencies, the power supply portion including a source power supply configured to supply a source power for generating plasma from a gas in the chamber to the upper electrode or the lower electrode, and at least one bias power supply configured to supply one bias power or two or more bias powers having different frequencies to the lower electrode; at least one variable passive component electrically connected to the edge ring; and at least one bypass circuit that electrically connects the power supply portion and the edge ring and is configured to supply a part of at least one power selected from the group consisting of the source power and at least one bias power to the edge ring.