The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 19, 2024

Filed:

Sep. 13, 2021
Applicant:

Asm Ip Holding B.v., Almere, NL;

Inventors:

Varun Sharma, Helsinki, FI;

Daniele Chiappe, Espoo, FI;

Eva Tois, Espoo, FI;

Viraj Madhiwala, Helsinki, FI;

Marko Tuominen, Helsinki, FI;

Charles Dezelah, Helsinki, FI;

Michael Givens, Oud-Heverlee, BE;

Tom Blomberg, Vantaa, FI;

Assignee:

ASM IP Holding B.V., Almere, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02164 (2013.01); H01L 21/02274 (2013.01); H01L 21/0228 (2013.01);
Abstract

The current disclosure relates to methods of depositing silicon oxide on a substrate, methods of forming a semiconductor device and a method of forming a structure. The method comprises providing a substrate in a reaction chamber, providing a silicon precursor in the reaction chamber, the silicon precursor comprising a silicon atom connected to at least one oxygen atom, the at least one oxygen atom being connected to a carbon atom, and providing a reactant comprising hydrogen atoms in the reaction chamber to form silicon oxide on the substrate.


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