The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 19, 2024

Filed:

Jul. 25, 2023
Applicant:

Kepler Computing Inc., San Francisco, CA (US);

Inventors:

Sasikanth Manipatruni, Portland, OR (US);

Niloy Mukherjee, San Ramon, CA (US);

Noriyuki Sato, Palo Alto, CA (US);

Tanay Gosavi, Portland, OR (US);

Somilkumar J. Rathi, San Jose, CA (US);

James David Clarkson, El Sobrante, CA (US);

Rajeev Kumar Dokania, Beaverton, OR (US);

Debo Olaosebikan, San Francisco, CA (US);

Amrita Mathuriya, Portland, OR (US);

Assignee:

Kepler Computing Inc., San Francisco, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06Q 10/087 (2023.01); G06Q 30/04 (2012.01); G16C 20/70 (2019.01);
U.S. Cl.
CPC ...
G06Q 10/087 (2013.01); G06Q 30/04 (2013.01); G16C 20/70 (2019.02);
Abstract

A method for monetizing ferroelectric process development is described. In at least one embodiment, the method comprises procuring a target material based on a model driven selection which is based on charge, mass and magnetic moment, and/or mass of the atomic constituents of the target material. The method further comprises applying the target material to a fabrication process to build a ferroelectric device. The method further comprises generating a notification indicative of procurement of the target material and application of the target material. The method further comprises electronically transmitting the notification to a customer, wherein the notification includes an invoice having a line item associated with a cost of the procuring of the target material and application of the target material.


Find Patent Forward Citations

Loading…