The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 12, 2024
Filed:
Jun. 14, 2021
Applicant:
Lam Research Corporation, Fremont, CA (US);
Inventors:
Pratik Mankidy, Fremont, CA (US);
John Holland, San Jose, CA (US);
Anthony de la Llera, Fremont, CA (US);
Rajesh Dorai, Pleasanton, CA (US);
Assignee:
Lam Research Corporation, Fremont, CA (US);
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01); H01J 37/32 (2006.01); C23C 2/00 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45565 (2013.01); H01J 37/32449 (2013.01); C23C 2/003 (2013.01); C23C 16/4558 (2013.01); H01J 37/3244 (2013.01); H01L 21/02002 (2013.01); H01L 21/02104 (2013.01);
Abstract
Showerhead faceplates for semiconductor processing chambers are provided that include one or more sets of gas distribution passages therethrough that extend at least partially along axes that are at an oblique angle to the showerhead faceplate center axis. Such angled gas distribution passages may be used to tailor the gas flow characteristics of such showerhead faceplates to produce various desired gas flow behaviors in the gas that is delivered to the wafer via such showerhead faceplates.