The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 12, 2024

Filed:

Feb. 16, 2021
Applicants:

Applied Materials, Inc., Santa Clara, CA (US);

National University of Singapore, Singapore, SG;

Inventors:

Prayudi Lianto, Singapore, SG;

Guan Huei See, Singapore, SG;

Arvind Sundarrajan, Singapore, SG;

Andrivo Rusydi, Singapore, SG;

Muhammad Avicenna Naradipa, Singapore, SG;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B 57/02 (2006.01); G01N 21/21 (2006.01);
U.S. Cl.
CPC ...
B24B 57/02 (2013.01); G01N 21/211 (2013.01); G01N 2021/213 (2013.01);
Abstract

Methods and apparatus for processing a substrate are provided herein. For example, a method of processing a substrate using extended spectroscopic ellipsometry (ESE) includes directing a beam from an extended spectroscopic ellipsometer toward a surface of a substrate for determining in-situ ESE data therefrom during substrate processing, measuring a change of phase and amplitude in determined in-situ ESE data, and determining various aspects of the surface of the substrate using simultaneously complex dielectric function, optical conductivity, and electronic correlations from a measured change of phase and amplitude in the in-situ ESE data.


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