The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 29, 2024
Filed:
Oct. 05, 2020
Applied Materials, Inc., Santa Clara, CA (US);
Katherine Woo, Santa Clara, CA (US);
Paul L. Brillhart, Pleasanton, CA (US);
Jian Li, Fremont, CA (US);
Shinnosuke Kawaguchi, Adachi-Ku, JP;
David W. Groechel, Sunnyvale, CA (US);
Dorothea Buechel-Rimmel, Sunnyvale, CA (US);
Juan Carlos Rocha-Alvarez, San Carlos, CA (US);
Paul E. Fisher, Los Altos, CA (US);
Chidambara A. Ramalingam, Fremont, CA (US);
Joseph J. Farah, Hollister, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Exemplary semiconductor processing systems may include a chamber body including sidewalls and a base. The chamber body may define an interior volume. The systems may include a substrate support extending through the base of the chamber body. The substrate support may be configured to support a substrate within the interior volume. The systems may include a faceplate positioned within the interior volume of the chamber body. The faceplate may define a plurality of apertures through the faceplate. The systems may include a leveling apparatus seated on the substrate support. The leveling apparatus may include a plurality of piezoelectric pressure sensors.