The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 01, 2024

Filed:

Sep. 25, 2020
Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventor:

Mirko Vukovic, Albany, NY (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 37/20 (2006.01); G03F 7/16 (2006.01); H01J 37/317 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
G03F 7/168 (2013.01); G03F 7/162 (2013.01); H01J 37/20 (2013.01); H01J 37/3174 (2013.01); H01L 21/67069 (2013.01); H01J 2237/20214 (2013.01); H01J 2237/31774 (2013.01);
Abstract

A substrate processing system including a processing chamber, a substrate holder configured to hold and rotate a substrate about an axis perpendicular to a working surface of the substrate; an electron emitter adapted to emit a first electron beam directed at a first surface of a peripheral region of the substrate, the first electron beam having a first beam energy and a first beam current sufficient to vaporize material from the first surface of the peripheral region of the substrate; an airflow system configured to direct a flow of gas across the working surface of the substrate; and an exhaust system configured to collect the gas comprising the material vaporized from the peripheral region.


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