The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 24, 2024
Filed:
Jun. 25, 2022
The 59th Institute of China Ordnance Industry, Chongqing, CN;
Lin Zheng, Chongqing, CN;
Shitao Dou, Chongqing, CN;
Xin Chen, Chongqing, CN;
Lunwu Zhang, Chongqing, CN;
Jin Zhang, Chongqing, CN;
Taibin Wu, Chongqing, CN;
Luchang Che, Chongqing, CN;
Chengzhang Wang, Chongqing, CN;
Kun Zhou, Chongqing, CN;
Fangchao Zhao, Chongqing, CN;
Changguang He, Chongqing, CN;
Xianhe Feng, Chongqing, CN;
THE 59TH INSTITUTE OF CHINA ORDNANCE INDUSTRY, Chongqing, CN;
Abstract
A device for measuring short-wavelength characteristic X-ray diffraction based on array detection, and a measurement and analysis method based on the device are provided. An array detector of the device only detects and receives a diffraction ray which is diffracted by a material of a to-be-measured part inside a sample and passes through a through hole of a receiving collimator, and rays passing through a positioning hole. The to-be-measured part inside the sample is placed at the center of the diffractometer circle of the device. The method is performed with the device. With the present disclosure, a diffraction pattern of a part inside the sample with a centimeter thickness, i.e. Debye rings, can be rapidly and non-destructively measured, thereby rapidly and non-destructively measuring and analyzing crystal structures, and its crystal structural change of the part inside the sample, such as phase, texture, and stress.