The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 17, 2024

Filed:

Jul. 09, 2021
Applicant:

Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;

Inventors:

Bruce Cho, Hsinchu, TW;

Chia-Ying Tien, Hsinchu, TW;

Huang-Chu Ko, Hsinchu, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); B24B 1/00 (2006.01); B24B 37/005 (2012.01); B24B 37/04 (2012.01); B24B 37/10 (2012.01); B24B 47/12 (2006.01); H01L 21/306 (2006.01); H01L 21/321 (2006.01); H01L 21/687 (2006.01); H02P 29/00 (2016.01);
U.S. Cl.
CPC ...
B24B 47/12 (2013.01); B24B 1/00 (2013.01); B24B 37/005 (2013.01); B24B 37/044 (2013.01); B24B 37/10 (2013.01); H01L 21/30625 (2013.01); H01L 21/3212 (2013.01); H02P 29/00 (2013.01);
Abstract

A device includes a rotator assembly configured to control a rotational kinetic energy of a wafer-platen based on an electrical energy input. The device further includes a controller configured to control the rotational kinetic energy of the wafer-platen, wherein a rotational velocity of the wafer-platen is either increased or decreased. The device further includes a converter configured to generate an electrical energy output of the rotator assembly based on decreased rotational kinetic energy of the wafer-platen. The device further includes an energy storage device configured to store the electrical energy outputted by the rotator assembly based on the decreased rotational kinetic energy of the wafer-platen.


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