The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 10, 2024
Filed:
Sep. 08, 2020
Applicant:
Auros Technology, Inc., Hwaseong-si, KR;
Inventors:
Assignee:
AUROS TECHNOLOGY, INC., Hwaseong-si, KR;
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G01B 11/27 (2006.01); G01B 11/06 (2006.01); G03F 7/00 (2006.01); G03F 9/00 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
G01B 11/27 (2013.01); G01B 11/0608 (2013.01); G03F 7/70633 (2013.01); G03F 7/7085 (2013.01); G03F 9/7088 (2013.01); H01L 21/67259 (2013.01);
Abstract
An overlay measurement device measures an error between a first overlay mark and a second overlay mark respectively formed on different layers formed on a wafer. The device is configured to detect a height of the first overlay mark based on a change in the signal of the first detector according to a change in the relative position of the objective lens with respect to the wafer in the optical axis direction and detect a height of the second overlay mark based on a change in the signal of the second detector according to a change in the relative position of the objective lens with respect to the wafer in the optical axis direction.