The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 27, 2024

Filed:

Sep. 28, 2021
Applicant:

Asml Netherlands B.v., Veldhoven, NL;

Inventors:

Yan Wang, San Jose, CA (US);

Jian Zhang, San Jose, CA (US);

Zhiwen Kang, San Jose, CA (US);

Yixiang Wang, Fremont, CA (US);

Assignee:

ASML NETHERLANDS B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 15/08 (2006.01); H01J 37/20 (2006.01); H01J 37/21 (2006.01); H01J 37/22 (2006.01); H01J 37/28 (2006.01);
U.S. Cl.
CPC ...
G01B 15/08 (2013.01); H01J 37/20 (2013.01); H01J 37/21 (2013.01); H01J 37/222 (2013.01); H01J 37/28 (2013.01); H01J 2237/20235 (2013.01); H01J 2237/2814 (2013.01);
Abstract

An inspection apparatus for adjusting a working height for a substrate for multiple target heights is disclosed. The inspection apparatus includes a radiation source configured to provide a radiation beam and a beam splitter configured to split the radiation beam into multiple beamlets that each reflect off a substrate. Each beamlet contains light of multiple wavelengths. The inspection apparatus includes multiple light reflecting components, wherein each light reflecting component is associated with one of the beamlets reflecting off the substrate and is configured to support a different target height for the substrate by detecting a height or a levelness of the substrate based on the beamlet reflecting off the substrate.


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