The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 20, 2024

Filed:

Jul. 12, 2022
Applicant:

Micron Technology, Inc., Boise, ID (US);

Inventors:

Hong Li, Boise, ID (US);

Ramaswamy Ishwar Venkatanarayanan, Garden City, ID (US);

Sanh D. Tang, Kuna, ID (US);

Erica L. Poelstra, Boise, ID (US);

Assignee:

Micron Technology, Inc., Boise, ID (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H10B 12/00 (2023.01); G11C 11/402 (2006.01); H01L 23/49 (2006.01); H01L 23/538 (2006.01); H01L 29/66 (2006.01); H01L 29/78 (2006.01);
U.S. Cl.
CPC ...
H10B 12/488 (2023.02); G11C 11/4023 (2013.01); H01L 23/49 (2013.01); H01L 23/538 (2013.01); H01L 29/66666 (2013.01); H01L 29/7827 (2013.01); H10B 12/053 (2023.02); H10B 12/30 (2023.02); H10B 12/31 (2023.02); H10B 12/315 (2023.02); H10B 12/34 (2023.02);
Abstract

Some embodiments include a method of forming an integrated assembly. A structure is provided to have conductive lines, and to have rails over the conductive lines and extending in a direction which crosses the conductive lines. Each of the rails includes pillars of semiconductor material. The rails have sidewall surfaces along spaces between the rails. The pillars have upper segments, middle segments and lower segments. First-material liners are formed along the sidewall surfaces of the rails. A second material is formed over the liners. First sections of the liners are removed to form gaps between the second material and the sidewall surfaces of the rails. Second sections of the liners remain under the gaps. Conductive material is formed within the gaps. The conductive material is configured as conductive lines which are along the middle segments of the pillars.


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