The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 06, 2024
Filed:
Oct. 04, 2019
Hitachi High-tech Corporation, Tokyo, JP;
Hitachi High-Tech Corporation, Tokyo, JP;
Abstract
Provided is a charged particle beam device for which deterioration in throughput in the event of abnormality of multiple beams can be prevented. The charged particle beam device includes: a stageon which a sample is mounted; a charged particle optical system configured to irradiate the sample with multiple beams including multiple primary beams; a detectorconfigured to detect secondary beams generated by interactions between the primary beams and the sample and output detection signals; and a control unitconfigured to control the stage and the charged particle optical system to generate image data based on the detection signals from the detector obtained by scanning the sample with the multiple beams using a first scanning method. The control unit changes, when the abnormality of the multiple beams is detected based on the image data, the multiple beams to scan the sample using a second scanning method, and a scanning width of the multiple beams for scanning the sample is greater in the second scanning method than in the first scanning method.