The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 06, 2024
Filed:
Sep. 02, 2021
Applicant:
Kla Corporation, Milpitas, CA (US);
Inventors:
Bjorn Brauer, Beaverton, OR (US);
Sangbong Park, Danville, CA (US);
Hucheng Lee, Cupertino, CA (US);
Assignee:
KLA Corporation, Milpitas, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 7/00 (2017.01); G06T 7/33 (2017.01); G06T 7/80 (2017.01); G06V 10/24 (2022.01); G06V 10/75 (2022.01);
U.S. Cl.
CPC ...
G06T 7/001 (2013.01); G06T 7/337 (2017.01); G06T 7/80 (2017.01); G06V 10/24 (2022.01); G06V 10/751 (2022.01); G06T 2207/10148 (2013.01); G06T 2207/30148 (2013.01); G06V 2201/06 (2022.01);
Abstract
Wafer-to-wafer and within-wafer image contrast variations can be identified and mitigated by extracting an image frame during recipe setup and then during runtime at the same location. Image contrast is determined for the two image frames. A ratio of the contrast for the two image frames can be used to determine contrast variations and focus variation.