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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12046489 B1

PDFFull Text
Date of Patent:
Jul. 23, 2024

Filed:

Dec. 14, 2021

Workpiece processing apparatus with thermal processing systems

Applicants:

Mattson Technology, Inc., Fremont, CA (US);

Beijing E-town Semiconductor Technology Co., Ltd., Beijing, CN;

Inventors:

Rolf Bremensdorfer, Bibertal, DE;

Dieter Hezler, Lonsee-Halzhausen, DE;

Assignees:

Beijing E-Town Semiconductor Technology Co., Ltd., Beijing, CN;

Mattson Technology, Inc., Fremont, CA (US);

Attorney:

Dority & Manning, P.A.

Primary Examiner:

Michael G Hoang

Assistant Examiner:

Kurt J Wolford

Int. Cl.
CPC ...
H01L 21/67 (2006.01); F27B 17/00 (2006.01); F27D 7/02 (2006.01); G01J 5/10 (2006.01); G01J 5/58 (2022.01); H05B 1/02 (2006.01); H05B 3/00 (2006.01); G01J 5/00 (2022.01);
U.S. Cl.
CPC ...
H01L 21/67115 (2013.01); F27B 17/0025 (2013.01); F27D 7/02 (2013.01); G01J 5/10 (2013.01); G01J 5/58 (2013.01); H01L 21/67248 (2013.01); H05B 1/0233 (2013.01); H05B 3/0047 (2013.01); G01J 5/0007 (2013.01);
Abstract

A processing apparatus for a thermal treatment of a workpiece is presented. The processing apparatus includes a processing chamber, a workpiece support disposed within the processing chamber, a gas delivery system configured to flow one or more process gases into the processing chamber from the a first side of the processing chamber, one or more radiative heating sources disposed on the second side of the processing chamber, one or more dielectric windows disposed between the workpiece support and the one or more radiative heating sources, a rotation system configured to rotate the one or more radiative heating sources, and a workpiece temperature measurement system configured at a temperature measurement wavelength range to obtain a measurement indicative of a temperature of a back side of the workpiece.

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Bremensdorfer, Rolf. (2024). Workpiece processing apparatus with thermal processing systems (U.S. Patent No. 12046489). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12046489

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