The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 09, 2024

Filed:

Nov. 17, 2020
Applicant:

Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;

Inventors:

Dian-Sheg Yu, Hsinchu, TW;

Ren-Fen Tsui, Taipei, TW;

Jhon Jhy Liaw, Zhudong Township, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 23/525 (2006.01); H01L 21/8234 (2006.01); H01L 27/02 (2006.01); H01L 27/06 (2006.01); H10B 20/20 (2023.01);
U.S. Cl.
CPC ...
H01L 23/5256 (2013.01); H01L 21/8234 (2013.01); H01L 27/0207 (2013.01); H01L 27/0617 (2013.01); H10B 20/20 (2023.02);
Abstract

A structure and method for the formation and use of fuses within a semiconductor device is provided. The fuses may be formed within the third metal layer and are formed so as to be arranged perpendicularly to active devices located on an underlying semiconductor substrate. Additionally, the fuses within the third metal layer may be formed thicker than an underlying second metal layer.


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