The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 02, 2024

Filed:

Sep. 09, 2021
Applicant:

Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;

Inventors:

Peng-Chun Liou, Hsinchu, TW;

Zhiqiang Wu, Chubei, TW;

Chung-Wei Wu, Ju-Bei, TW;

Yi-Ching Liu, Hsinchu, TW;

Chia-En Huang, Xinfeng, TW;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H10B 51/20 (2023.01); H01L 21/768 (2006.01); H01L 23/522 (2006.01); H01L 23/528 (2006.01); H01L 29/10 (2006.01);
U.S. Cl.
CPC ...
H10B 51/20 (2023.02); H01L 21/76804 (2013.01); H01L 21/76877 (2013.01); H01L 23/5226 (2013.01); H01L 23/5283 (2013.01); H01L 29/105 (2013.01);
Abstract

A semiconductor device comprises a first conductive structure extending along a vertical direction and a second conductive structuring extending along the vertical direction. The second conductive structure is spaced apart from the first conductive structure along a lateral direction. The semiconductor device further comprises a plurality of third conductive structures each extending along the lateral direction. The plurality of third conductive structures are disposed across the first and second conductive structures. The semiconductor device further comprises a first semiconductor channel extending along the vertical direction. The first semiconductor channel is disposed between the plurality of third conductive structures and the first conductive structure and between the plurality of third conductive structures and the second conductive structure. The first and second conductive structures each have a varying width along the lateral direction, and the first semiconductor channel has a doping concentration varying along the vertical direction.


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